NEXAFS N K-edge study of the bonding structure on Al/Si doped sputtered CrN coatings

M. Mahbubur Rahman, Zhong Tao Jiang, Xiaofei Duan, Zonghan Xie, Anton Tadich, Zhi Feng Zhou, Nicholas Mondinos, Chun Yang Yin, Mohammednoor Altarawneh, Bogdan Z. Dlugogorski

Research output: Contribution to journalArticle

Abstract

Chromium nitride (CrN)-based materials display broad applications as protective coatings for automotive, power generation and aerospace industries, in which surfaces are often subjected to wear and corrosion. By using an appropriate choice of dopant, one can further increase the mechanical hardness, corrosion and oxidation resistance of these coatings. In order to identify the effect of dopants on the structural evolution and surface electronic properties of CrN coatings, Cr1-z(Al/Si)zN coatings were prepared by magnetron sputtering and then characterized via X-ray diffraction (XRD) and soft X-ray synchrotron radiation Near-edge X-ray Absorption Fine Structure (NEXAFS) studies around N K-edge. Higher degree of crystallinity of the coatings were identified through XRD studies. The bonding structure, of the doped CrN coating, was analyzed by Near-edge X-ray Absorption Fine Structure (NEXAFS) measurements performed around the N K-edge (390-450 eV) in the Auger electron yield (AEY) and total fluorescence yield (TFY) modes. NEXAFS analysis revealed Cr3d(Al3p/Si3p)N2p hybridizations in Cr1-z(Al/Si)zN compositions and complex structure splitting via spin-orbit interaction of the Cr3d levels.

Original languageEnglish
Pages (from-to)268-273
Number of pages6
JournalJournal of Alloys and Compounds
Volume661
Issue numberMarch
Early online date2 Dec 2015
DOIs
Publication statusPublished - 15 Mar 2016
Externally publishedYes

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  • Cite this

    Rahman, M. M., Jiang, Z. T., Duan, X., Xie, Z., Tadich, A., Zhou, Z. F., Mondinos, N., Yin, C. Y., Altarawneh, M., & Dlugogorski, B. Z. (2016). NEXAFS N K-edge study of the bonding structure on Al/Si doped sputtered CrN coatings. Journal of Alloys and Compounds, 661(March), 268-273. https://doi.org/10.1016/j.jallcom.2015.11.128